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NANOFABRICATION
RESEARCH LABORATORY CAPABILITIES
The Nanofabrication Research Laboratory (NRL)
at CNMS includes approximately 10,000 ft2 of clean room
space in a bay and chase configuration (see
schematic). This clean room space and the capabilities it houses
provide support for users in all of the CNMS Scientific Themes. The
following capabilities are available in the NRL:
Process Design
- Assistance
with design of process flow to implement users’ device
concepts using the facilities housed in the CNMS Nanofabrication
Research Laboratory.
E-Beam
Lithography
- State
of the art JEOL JBX-9300–100 kV electron beam lithography
system for high resolution nanopatterning. Requisite
resist processing tools.
Dual-beam
SEM/FIB
- State-of-the-art
FEI Nova 600 scanning electron microscope/focused ion beam system
for micro- and nanofabrication.
General
Cleanroom Use
- Optical
Lithography
Contact mask aligner system with broadband
(405–365 nm) exposure optics. Optical stepper with i-line
(365 nm) exposure optics and 5X mask reduction. Laser-based optical
mask writer system to support mask development needs.
- High-Resolution SEM Analysis
JEOL JSM-7400 field-emission
scanning electron microscope.
- Deep Silicon Etching/ Reactive Ion Etching
An
Oxford 100 DRIE/RIE system capable of Bosch process etching, Cryo
processing, and standard
RIE dry etching of silicon, silicon oxide, and silicon nitride materials
for MEMs, NEMs, and general silicon fabrication.
- Thermal Oxidation
Furnace
A high temperature wet/dry oxidation furnace is available
for the growth of high quality silicon dioxide thin
films on silicon substrates.
- Chemical Vapor Deposition
Low pressure
chemical vapor deposition of SiO2, Si3N4 (low
stress), and poly-Si (doped and undoped). Low
temperature plasma enhanced chemical vapor deposition of SiO2,
Si3N4 and silicon oxy-nitrides.
- Physical Vapor Deposition
E-beam
evaporation, thermal evaporation, and sputter deposition of metals,
semiconductors, and dielectrics.
- Reactive Ion Etching
A
Technics RIE system is available for dry etching dielectric and
polymer materials (future).
- Spectroscopic Reflectometry
- Surface Profilometry
- Electrical Properties Measurements (DC to 6 GHZ)
Capabilities
provided by other CNMS groups
Macromolecular Nanomaterials
Catalytic Nanosystems
Functional Hybrid Nanostructures
Scanning Probes &
Nanoscale Physics
Electron Microscopy,
Neutron and X-ray Scattering
Nanomaterials Theory
Institute
Bio-Inspired Nanomaterials
General Characterization Facilities
Collaborating Facilities |
